Investigation and comparison of electrical and optical properties of RF sputtered Cu doped ZnO and ZnO/Cu/ZnO multilayer films

Sara Zaabat; Fatiha  Challali; Mahmoud  Chakaroun; Boudine Boubaker; Azzedine Boudrioua

Investigation and comparison of electrical and optical properties of RF sputtered Cu doped ZnO and ZnO/Cu/ZnO multilayer films

Authors

Sara Zaabat LCAM Laboratory, University Larbi Ben M’hidi, 0004, Oum El Bouaghi, Algeria. b LPL Laboratory, UMR 7538, University of Paris 13 Nord, France
Fatiha Challali LSPM Laboratory, Cnrs – UPR 3407, University of Paris 13 Nord, France
Mahmoud Chakaroun LPL Laboratory, UMR 7538, University of Paris 13 Nord, France
Boudine Boubaker Laboratory of Crystallography, University of Constantine 1, 25000 Constantine, Algeria
Azzedine Boudrioua LPL Laboratory, UMR 7538, University of Paris 13 Nord, France

Keywords:

ZnO:Cu ,, multilayers,, esistivity,, ransmittance,, sputtering

Abstract

This study presents the comparison of structural, electrical and optical properties of Cu doped ZnO films and
ZnO/Cu/ZnO multilayer films before and after annealing, they are produced via radio frequency magnetron
sputtering. the results showed that all films has a good crystalline properties after annealing, ZnO/Cu/ZnO
multilayer films showed low resistivity of 1.8 × 10 -3 Ω.cm and an average transmittance of 75%, these parameter
values indicate that films are a potential candidate for high-quality electrodes in various displays

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Published

2025-01-06

How to Cite

Zaabat , S., Challali , F., Chakaroun , M., Boubaker , B., & Boudrioua , A. (2025). Investigation and comparison of electrical and optical properties of RF sputtered Cu doped ZnO and ZnO/Cu/ZnO multilayer films. Journal of New Technology and Materials, 9(02), 45–50. Retrieved from http://review.univ-oeb.dz/ojs.jntm/index.php/jntm/article/view/133